1.
Regulatory Challenges of AI Governance in the Era of ChatGPT
Islam, Toriqul,. Author.
[N.P.] : Kluwer Law International, 2024.
English | View e-resource | Available Online |
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2.
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3.
Fundamentals of United States Intellectual Property Law: Copyright, Patent, and Trademark.
Reid, Amanda., Port, Kenneth L., Tu, Shine (Sean).
[Alphen aan den Rijn, Netherlands] : Kluwer Law International, 2024.
8th ed.
English | View e-resource | Available Online |
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4.
Collective Management of Copyright and Related Rights
Gervais, Daniel editor. ; Quintais, João Pedro editor.
Wolters Kluwer: Kluwer Law International, 2024.
Fourth edition.
English | View e-resource | Available Online |
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5.
Invalidation of Trademark Registration Obtained in Bad Faith
[Oxford, England] : Oxford University Press (OUP), 2024.
English | 10.1093/grurint/ikae103 | View e-resource | Available Online |
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6.
Full Compensation of Moral Harm Caused to the Trade Mark Owner
[Oxford, England] : Oxford University Press (OUP), 2024.
English | 10.1093/grurint/ikae053 | View e-resource | Available Online |
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7.
Training course on the legal, administrative and economic aspects of industrial property (see under GENERAL INTRODUCTORY COURSE IN THE FIELD OF I
[Geneva, Switzerland] : [World Intellectual Property Organization], [1990]
English | E 231F10 WIPO.T |
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8.
Training course on the legal, administrative and economic aspects of industrial property (see under GENERAL INTRODUCTORY COURSE IN THE FIELD OF I
[Geneva, Switzerland] : [World Intellectual Property Organization], [1993]
English | E 231F10 WIPO.G |
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9.
Training course on the legal, administrative and economic aspects of industrial property (see under GENERAL INTRODUCTORY COURSE IN THE FIELD OF I
[Geneva, Switzerland] : [World Intellectual Property Organization], [1991]
English | E 231F10 WIPO.T |
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10.
Training course on the legal, administrative and economic aspects of industrial property (see under GENERAL INTRODUCTORY COURSE IN THE FIELD OF I
[Geneva, Switzerland] : [World Intellectual Property Organization], [1992]
English | E 231F10 WIPO.T |
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