time,value,indicator code,description,unit,time unit,ind_type,dim1 unit,dim2 unit,dim3 unit
1936,0.4888888888888889,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1943,0.1907407407407407,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1947,0.1860082304526749,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1948,0.4888888888888889,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1949,0.4888888888888889,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1950,0.4193293885601577,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1951,0.4888888888888889,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1952,0.2844444444444445,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1953,0.4071111111111111,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1954,0.21010101010101012,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1955,0.3151111111111112,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1956,0.19340277777777778,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1957,0.14133333333333337,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1958,0.19943310657596372,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1959,0.10583085393796379,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1960,0.18019323671497586,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1961,0.15391005102646257,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1962,0.19188475665748395,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1963,0.11999801705334129,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1964,0.128703027351676,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1965,0.15662442607897153,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1966,0.1172024294768693,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1967,0.15536873506500407,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1968,0.13172125293337417,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1969,0.26165595867976815,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1970,0.2713201943488522,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1971,0.23024133326839877,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1972,0.13836579952641437,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1973,0.18634592980176232,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1974,0.18770865906275366,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1975,0.1802361303860707,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1976,0.14701823011488752,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1977,0.11994828136697934,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1978,0.1711149155583752,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1979,0.1591024716989192,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1980,0.15245422556211607,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1981,0.1369716926875114,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1982,0.12444203645533182,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1983,0.142627386776087,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1984,0.13339205181566174,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1985,0.14182352225242406,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1986,0.18996500236739206,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1987,0.14485056089714793,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1988,0.14726860921419685,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1989,0.13082445854158656,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1990,0.12919527298863473,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1991,0.12202030143274918,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1992,0.12437522042800074,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1993,0.1212109058301141,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1994,0.11022144530631538,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1995,0.12186381179021247,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1996,0.11348771282744705,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1997,0.10437722431482502,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1998,0.10899355629133657,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
1999,0.10546366697374125,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2000,0.1064313871193844,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2001,0.11524819251140553,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2002,0.11078021334047825,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2003,0.10965013992115492,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2004,0.11666095256542701,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2005,0.09425377298125369,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2006,0.09518236119908328,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2007,0.09243131261132742,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2008,0.1006447515740452,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2009,0.09501701158614602,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2010,0.09061703940291888,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2011,0.08917907202652463,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2012,0.08610678913104414,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2013,0.08441558956132784,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2014,0.08351968107180523,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2015,0.08097186351243983,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2016,0.07971108041370555,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2017,0.07771083957444984,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2018,0.07589823109091563,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2019,0.0756295125193512,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2020,0.08036719568410386,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2021,0.07634321237549709,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2022,0.08292431018667633,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2023,0.08427183957075857,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
2024,0.08316978037153755,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
no_data,0.4888888888888889,INOSYS.TDM.TDMAPP.HHI.YEAR.TEC2,"Concentration of Trademarks applications in technological field, fractional count, yearly",,,hhi,TEC2,,
